English العربية کوردی
01006011

Dr. Dler Adil Jameel

Assistant Professor
College of Science / Department of Physics
07501881787
dler.jameel@uoz.edu.krd
Number of Publications: 30
0
Awards
30
Published Journal Articles
2
Thesis
21
Training Course

1
Book Chapter
21
Conference
0
Presentation
0
Workshop
2016
Doctor of Philosophy

School of Physics and Astronomy
The University of Nottingham

2008
Master

Physics
University of Duhok

2004
Bachelor

University of Duhok
University of Duhok

Synthesis Organic semiconductor materials, Deposition organic semiconductor materials on Inorganic semiconductor material, Deep Level Transient Spectroscopic (DLTS) System, LCR System, Photoluminescence (PL) System, Solar System simulation, Vacuum System for deposition, Origin program, Microsoft Office such as Word, Excel and Power point.

Google scholar
Researchgate
Scopus

2012

COST

Member

2012-10-01,current
PhysSoc Nottingham

Member

2012-10-01,current
Kurdish Society in University of Nottingham, Nottingham, United Kingdom

PhysSoc Nottingham

2012-10-01,2016-08-30
Assistant Professor

Date: 2022-03-27

Director of Directorate of Quality Assurance of University of Zakho

Date: 2019-09-22

Director of Training and Development Center, University of Zakho

Date: 2018-09-03

Lecturer

Date: 2016-10-15

Lecturer

Date: 2016-07-27

Assistant Lecturer

Date: 2009-01-12

Assistance Researcher

Date: 2004-10-03

2025

Electrical characterization at different temperature of PANI/GaAs heterostructures grown on (311)A n-GaAs plane
Applied Physics A: Materials Science & Processing (Volume : 131)
This work investigates the electrical properties of polyaniline (PANI)/n-GaAs hybrid devices. PANI thin films were spin￾coated onto (311)A, (311)B and (100) n-GaAs substrates and characterized using Atomic Force Microscopy (AFM) and Raman spectroscopy. The AFM results reveal that the (311)A surface has significantly higher roughness (3.64 nm) compared to the (311)B (1.87 nm) and (100) (0.99 nm) surfaces. Raman spectra suggest that the increased roughness and surface step density of the (311)A orientation promote improved polymer alignment, stronger interfacial bonding, and enhanced π-conjugation, contributing to the superior electrical performance of the (311)A films. Electrical measure￾ments, including dark current-voltage (I-V) and capacitance-voltage (C-V), were conducted over a temperature range of 20–440 K. The I-V characteristics show a decrease in the ideality factor and an increase in barrier height with rising temperature. Additionally, interface states were analyzed through series resistance measurements using capacitance-con￾ductance-voltage (C-G-V) techniques. These findings demonstrate that PANI films deposited on (311)A GaAs substrates exhibit superior electrical performance compared to those grown on conventional (100) GaAs and (311)B GaAs substrates.
2025-08

2024

Effect of erbium-doping concentration on the electrical, structural and morphological properties of heterostructures based on TiO2 thin films
Bulletin of Materials Science (Issue : 47) (Volume : 42)
Effect of erbium (Er) doping on the electrical, structural and morphological properties of TiO2 thin films deposited by the combination of a simple sol–gel process and spin-coating technique on p-type silicon substrates, has been investigated. A systematic study of the effect of concentration of Er on the properties of heterostructures was carried out. Raman spectroscopy and atomic force microscopy have been used to study the structural and morphology properties of devices based on Er-doped TiO2/Si heterostructures. Deep level transient spectroscopy (DLTS) has been also employed to study the electrically active defects within the band gap of Er-doped TiO2 thin films. DLTS that has proved to be a powerful tool in analysing traps in semiconductors devices showed that undoped TiO2-based devices exhibit five defects. However, three defects have been detected in the low erbium-doped TiO2 devices and only one defect was observed in the higher erbium-doped devices. These results provide strong evidence that Er doping annihilates oxygen-related defects and demonstrate the effective proof of doping process in TiO2 thin film. This finding contributes to the improved activities (e.g., photocatalytic) of TiO2 since the increase in charge traps can reduce bulk recombination and consequently, separates photogenerated electrons and holes more efficiently. Furthermore, it is found that the overall electrical properties of the devices are improved by increasing Er doping concentration. This study provides an important understanding of the deep and shallow level defects in Er-doped TiO2 thin films, which is essential for the manufacturing of future devices including UV detectors.
2024-02

2023

Effects of Gamma Radiation on the Electrical Properties of InAs/InGaAs Quantum Dots Based Laser Structures Grown on GaAs and Si Substrates by Molecular Beam Epitaxy
Physical Chemistry Chemical Physics (Issue : 45) (Volume : 25)
This study investigates the impact of gamma radiation on the electrical properties of InAs/InGaAs quantum dots based laser structures grown on both GaAs (Sample A) and Si (Sample B) substrates using molecular beam epitaxy. The research explores the electrical characteristics of the lasers before and after being exposed to gamma radiation employing Current - Voltage (I-V), Capacitance - Voltage (C-V), Deep Level Transient Spectroscopy (DLTS) and Laplace DLTS techniques. The results show that the electrical properties of the lasers change due to gamma radiation exposure, and the extent of the change depends on the substrate used for growth. The I–V results revealed that the ideality factor (n) and built-in voltage were increased in Sample A and Sample B after radiation. Nonetheless, the series resistance (Rs) at room temperature decreased in both samples after radiation. Overall, this study provides valuable insights into the effects of gamma radiation on the electrical properties of InAs/InGaAs quantum dots lasers and highlights the importance of considering substrate materials in the design of radiation-hardened electronic devices.
2023-11
Design of Biodegradable Polymer Blend Electrolytes with Decoupled Ion Motion for EDLC Device Application: Electrical and Electrochemical Properties
Results in Physics (Volume : 51)
In this work, plasticized polymer blend electrolytes (PBEs) that are flexible and have quasi-solid-state properties have been prepared using the casting technique. Herein, we present the manufacture and characterization of biopolymer blend electrolytes based on chitosan (CS) and polyvinyl alcohol (PVA) with decoupled ion motion for EDLC device applications. Electrochemical impedance spectroscopy (EIS) was utilized to analyze the dielectric and ion conduction properties of the produced PBEs. Lithium nitrate (LiNO3) salt was used as an ion provider for the host polymers. With an increase in glycerol plasticizer concentration, both ion conduction and dielectric properties were significantly enhanced. The Argand diagram established that conductivity relaxation dynamics (pure ionic relaxation) is dominant at higher plasticizer concentrations. The highest ionic conductivity of S/cm was recorded for the host medium plasticized with 40 wt.% of glycerol, and it has been used as a mediator in the EDLC fabrication. Linear sweep voltammetry (LSV) was used to validate the eligibility of the PBE in terms of stability, and it was shown that the film was stable up to 2.93 V. The dominancy of ions as the main carrier in the prepared electrolyte was confirmed using transference number measurement (TNM) analysis, with tion= 0.922. The CR2032 coin cell type EDLC with activated carbon electrodes and the most conductive PBE film had a significantly high specific capacitance of ∼ 33 F/g through the cyclic voltammetry (CV) technique. The efficiency of the fabricated EDLC was remarkable, with an average of about 85% over 1000 cycles. Due to its high energy and power densities (4.5 Wh/kg and 1100 W/kg, respectively), this PBE system is well-suited for EDLC.
2023-06
Effects of substrate material on the electrical properties of self-assembled InAs quantum dots-based laser structures
Applied Physics A (Issue : 6) (Volume : 129)
In this work, the effects of the substrate material on the electrical properties of self-assembled InAs quantum dots (QDs)-based laser structures have been reported. Two InAs QD laser structures with the same active regions deposited on GaAs and Si substrates utilizing strain reducing layer (SRL) containing GaAs/InGaAs have been investigated using current–voltage (I–V), capacitance–voltage, and Deep-Level Transient Spectroscopy (DLTS) techniques. The I–V measurements illustrated that the rectification ratio (IF/IR) and built-in potential (ϕB) for the sample deposited on Si substrate are higher than that of sample deposited on GaAs substrate. However, the series resistance (Rs) of the InAs QDs deposited on Si substrate is lower than that of the InAs QDs deposited on GaAs substrate. The DLTS and Laplace-DLTS measurements showed that the number of traps in InAs QDs/GaAs devices is lower than that in InAs QDs/Si devices, corroborating with I–V results.
2023-05

2022

Optical properties of self-assembled InAs quantum dots based P–I–N structures grown on GaAs and Si substrates by Molecular Beam Epitaxy
Journal of Luminescence
Extensive work on InAs quantum dots grown on GaAs substrates has been reported in the literature. However, research in the use of different substrate materials such as silicon to achieve an ideal and full integration of photonic and electronic systems is still a challenge. In this work we have investigated the effect of the substrate material (Si and GaAs) and strain reducing layer on the optical properties of InAs quantum dots for possible applications in laser devices grown by Molecular Beam Epitaxy. Two InAs quantum dots structures with similar active regions grown on GaAs and Si substrates using strain reducing layer consisting of InAs QDs/6 nm In0.15Ga0.85As have been investigated. Atomic Force Microscopy, Transmission Electron Microscopy, and photoluminescence have been used for the characterization of the samples. We have observed a red shift of the InAs QD photoluminescence peak energy for the sample grown on Si substrate as compared to the sample grown on GaAs substrate, which was associated with residual biaxial strain from the Si/GaAs heterointerface. This red-shift of the photoluminescence peak energy is accompanied by a broadening of the photoluminescence spectrum from ∼31 meV to a value of ∼46 meV. This broadening is attributed to the quantum dots size inhomogeneity increase for samples grown on Si substrate. This result open new insights for the controlling the emission of InAs quantum dots for photonic devices integration using Si substrates.
2022-08
Effect of SiC polytypes on the electrical properties of polyaniline based heterojunctions
Applied Physics A (Issue : 89) (Volume : 128)
This work reports an extensive study of the effect of the SiC polytypes substrate on the electrical properties of heterostructures based on SiC and polyaniline (PANI) employing current–voltage (I–V), capacitance–voltage (C–V) and deep-level transient spectroscopy (DLTS) techniques. Two different SiC substrates, namely 4H-SiC and 6H-SiC, have been investigated. The I–V results revealed that the rectification ratio (IF/IR), turn-on voltage (Von) and barrier height (ϕbo) of PANI/4H-SiC hybrid device are higher than those for PANI/6H-SiC heterojunctions. The C–V measurements illustrated that the built-in potential (Vbi) of PANI deposited on 4H-SiC is greater than that of the PANI sample fabricated on 6H-SiC. Furthermore, the DLTS results showed that the energy of electrically active traps present at/close and away from the interface in devices based on the 4H-SiC substrate is lower than those of 6H-SiC substrates, corroborating with I–V results.
2022-03

2021

Modeling and the main stages of spin coating process: A review
JOURNAL OF APPLIED SCIENCE AND TECHNOLOGY TRENDS (Issue : 3) (Volume : 2)
Spin coating is a technique employed for the deposition of uniform thin films of organic materials in the range of micrometer to nanometer on flat substrates. Typically, a small amount of coating material generally as a liquid is dropped over the substrate center, which is either static or spinning at low speed. The substrate is then rotated at the desired speed and the coating material has been spread by centrifugal force. A device that is used for spin coating is termed a spin coater or just a spinner. The substrate continued to spin and the fluid spins off the boundaries of the substrate until the film is reached the required thickness. The thickness and the characteristics of coated layer (film) are depending on the number of rotations per minute (rpm) and the time of rotation. Therefore, a mathematical model is obtained to clarify the prevalent method controlling thin film fabrication. Viscosity and the concentration of (solution) spin coating material are also affecting the thickness of the substrate. This article reviews spin coating techniques including stages in the coating process such as deposition, spin-up, stable fluid outflow (spin-off), and evaporation. Additionally, the main affecting factors on the film thickness in the coating process are reviewed.
2021-08
Electrical performance of organic/inorganic hybrid solar cell devices based on n‑type GaAs substrate orientations and a conjugated polymer (PANI)
Applied Physics A (Volume : 127)
This article presents the electrical performance of hybrid organic/inorganic solar cell devices. Hybrid polyaniline (PANI)/n- GaAs photovoltaic devices were fabricated by spin coating of PANI thin films on conventional (100) and high index (311) A and (311)B n-GaAs substrates. The solar cell parameters of these devices, as obtained by current density–voltage (J–V) under illumination conditions, were found to be dependent on the substrate orientation. The PANI/(311)A n-GaAs devices revealed the best performance, with an open-circuit voltage (Voc) of 207 mV, a short-circuit current density (Jsc) of 0.267 mA/ cm2, a fill factor (FF) of 25% and an efficiency (  ) of 1.4 x 10-2% which is higher than that of PANI/(100) and (311)B hybrid samples. Additionally, the electrical properties of these junction diodes have been studied utilizing dark current density–voltage (J–V), capacitance–voltage (C–V), deep level transient spectroscopy (DLTS) and Laplace DLTS techniques. The dark J–V measurements showed that the rectification ratio (IF/IR), turn-on voltage (Von) and barrier height ( b ) of PANI/(311) A n-GaAs heterostructure are higher than those of PANI thin films deposited on (100) and (311)B n-GaAs substrates. The DLTS and Laplace DLTS measurements illustrated that the number of traps in PANI/(311)A n-GaAs devices is lower than that in PANI/(100) n-GaAs and PANI/(311)B n-GaAs devices, corroborating with J–V results.
2021-06

2020

THE EFFECTS OF N-GAAS SUBSTRATE ORIENTATIONS ON THE ELECTRICAL PERFORMANCE OF PANI/N-GAAS HYBRID SOLAR CELL DEVICES
Science Journal of University of Zakho (Issue : 4) (Volume : 8)
This paper reports the fabrication and electrical characterization of hybrid organic-inorganic solar cell based on the deposition of polyaniline (PANI) on n-type GaAs substrate with three different crystal orientations namely Au/PANI/(100) n-GaAs/(Ni-Au), Au/PANI/(110) n-GaAs/(Ni-Au), and Au/PANI/(311)B n-GaAs/(Ni-Au) using spin coating technique. The effect of crystallographic orientation of n-GaAs on solar cell efficiency of the hybrid solar cell devices has been studied utilizing current density-voltage (J-V) measurements under illumination conditions. Additionally, the influence of planes of n-GaAs on the diode parameters of the same devices has been investigated by employing current-voltage (I-V) characteristics in the dark conditions at room temperature. The experimental observations showed that the best performance was obtained for solar cells fabricated with the structure of Au/PANI/(311)B n-GaAs/(Ni-Au). The open-circuit voltage (Voc), short circuit current density (Jsc), and solar cell efficiency (𝜂) of the same device were shown the values of 342 mV, 0.294 mAcm-2, 0.0196%, respectively under illuminated condition. All the solar cell characteristics were carried out under standard AM 1.5 at room temperature. Also, diode parameters of PANI/(311)B n-GaAs heterostructures were calculated from the dark I-V measurements revealed the lower reverse saturation current (Io) of 3.0×10-9 A, higher barrier height (𝜙!) of 0.79 eV and lower ideality factor (n) of 3.16.
2020-12
Electrical Properties of Sulfonated Polyaniline Thin Film Grown on Different GaAs Substrates
e-Journal of Surface Science and Nanotechnology (Volume : 18)
The paper describes the impact of the crystallographic orienta-tion of an n-type GaAs substrate on the electrical properties of a sulfonated polyaniline (SPAN) thin film with a thickness of 120 nm grown on different n-type GaAs substrates orientation, which are (100), (311)A, and (311)B GaAs planes. Electrical characterization was performed by using current density-voltage (J−V) at room temperature and different temperatures (60−360 K). An ideality factor (n), a Schottky barrier height (Φb), and an activation energy (Ea) were extracted from forward J−V characteristics. From the J−V results, it was obtained that the rectification value at 0.5 V for the SPAN/(311)B GaAs hybrid device is higher than those for SPAN grown on the (100) and (311)A GaAs planes. Furthermore, as the temperature of the three heterojunction devices rises, the value of Φb increases, n drops, and Ea rises. The Ea measurements revealed that Ea for the SPAN/(311)B n-type GaAs heterostructure is lower than those for SPAN samples grown on the (100) and (311)A n-type GaAs planes. This could be related to the low number of defects in SPAN/(311)B than the other two samples. These results make SPAN with a thickness of 120 nm grown on the high index GaAs planes an interesting hybrid device for future devices applications.
2020-11
Investigation of the effects of GaAs substrate orientations on the electrical properties of sulfonated polyaniline based heterostructures
Applied Surface Science (Volume : 504)
In this work we present a detailed study of the influence of the GaAs substrate orientation on the electrical properties of heterojunctions based on GaAs and sulfonated polyaniline (SPAN) using Current-Voltage (I-V), Capacitance-Voltage (C-V), Deep-Level Transient Spectroscopy (DLTS) and Laplace DLTS techniques. Three different GaAs substrate orientations have been investigated, namely (1 0 0), (3 1 1)A and (3 1 1)B. The I-V results revealed that the turn-on voltage (Von) of SPAN/(3 1 1)B GaAs heterojunction is higher than that for SPAN/(1 0 0) GaAs and SPAN/(3 1 1)A GaAs heterojunctions. The DLTS results showed that the number of electrically active defects present in devices based on the lower index (1 0 0) plane of GaAs substrate is higher than those of higher index (3 1 1)A and (3 1 1)B GaAs substrates, corroborating with I-V results. In order to investigate the role of interface states, capacitance-frequency measurements were performed in forward bias on all three devices.
2020-02

2017

Characterisation of temperature dependent parameters of multi-quantum well (MQW) Ti/Au/n-AlGaAs/n-GaAs/n-AlGaAs Schottky diodes
Journal of Superlattices and Microstructures (Volume : 111)
Forward and reverse current-voltage (I V) of Ti/Au/n-Al?0.33Ga?0.67As/n-GaAs/n-Al?0.33Ga?0.67As multi-quantum well (MQW) Schottky diodes were measured over a range of temperatures from 20 to 400 K by a step of 20 K. The Schottky diodes parameters were then extracted from these characteristics. The Cheung method is used for this purpose, assuming a thermionic conduction mechanism. The extracted ideality factor decrease with increasing temperatures. But their values at low temperatures were found to be unrealistic. In order to explain this uncertainty, three assumptions were explored. Firstly an assumed inhomogeneous barrier height gave better parameters especially the Richardson constant but the ideality factor is still unrealistic at low temperatures. Secondly, by using numerical simulation, it was demonstrated that defects including interface states are not responsible for the apparent unrealistic Schottky diode parameters. The third assumption is the tunnelling mechanism through the barrier in the low temperature range. At these lower temperatures, the tunnelling mechanism was more suitable to explain the extracted parameters values.
2017-07
The Effect of Different Thicknesses of Evaporated CdTe Thin Films on The Electrical, Optical and Structural properties
The Journal of The University of Duhok
A different thickness of CdTe thin films were prepared from high purity Cd and Te blended powders by the way and Te blended powders by the way of thermal evaporation technique at a vacuum of 2 of 2*10 -5 mbar. Thin films were prepared on cleaned glass substrates at room temp temperature. The X-ray diffraction patterns for as prepared samples have an amorphous structure. The optical energy gap of the prepared CdTe thin films showed an increase in its value its value as the thickness increases . The minimum optical energy gap of the prepared samples was 1.60 eV for (1.612 nm ) and ) and the maximum optical energy for the sample was 2.226 eV for (2.226 nm).The electrical properties show .The electrical properties show .The electrical properties show.The electrical properties show .The electrical properties show .The electrical properties shows that all samples had an Ohmic contact.
2017-06
Investigation of defects in indium doped TiO2 thin films using electrical and optical techniques
Journal of Alloys and Compounds (Volume : 698)
Existence of defect levels into the band gap of titanium oxide (TiO2) due to indium (In) doping was investigated by Deep level transition spectroscopy (DLTS), Raman Spectroscopy and photoluminescence (PL). Particularly, two distinct e-beam grown TiO2 thin film (TF) samples on Si substrates were doped using In films with thicknesses of 5 nm and 50 nm instantaneous source. It was observed that the increasing in In doping concentration has changed the TiO2 crystal structure from anatase to rutile phase. In addition, the low doped Ti/Au/5 nm In/TiO2 TF samples showed at 5 V reverse-bias lower leakage current (3.0 x 10-7 A) as compared to the highly doped Ti/Au/50 nm In/TiO2 TF devices (7.0  105 A). The free carrier concentration was increased from about 1014 cm3 to 1015 cm3 for 5 nm In/TiO2 TF to 50 nm In/TiO2 TF devices, respectively. DLTS results have revealed a unique behaviour where a substantial reduction in deep trap concentration was observed in the samples having larger In doping. A PL band around 2.4 eV and 1.9 eV was observed for 5 nm and 50 nm In/TiO2 TF samples, respectively A blue shift of photoluminescence (PL) energy peak with the increase of temperature was also observed for both samples and was associated to defect related emissions. Finally, the shallow activation energy was determined from the temperature dependence of PL spectra. It was observed that the activation energy increased from 25 meV for the low In-doped TiO2 TF samples to 65 meV for the highly In-doped TiO2 TFs.
2017-01
Investigation of Electrically Active Defects in InGaAs Quantum Wires Intermediate-Band Solar Cells Using Deep-Level Transient Spectroscopy Technique
Journal of Nanotechnology (Volume : 28)
InGaAs quantum wire (QWr) intermediate-band solar cell–based nanostructures grown by molecular beam epitaxy are studied. The electrical and interface properties of these solar cell devices, as determined by current–voltage (I–V) and capacitance–voltage (C-V) techniques, were found to change with temperature over a wide range of 20–340 K. The electron and hole traps present in these devices have been investigated using deep-level transient spectroscopy (DLTS). The DLTS results showed that the traps detected in the QWr-doped devices are directly or indirectly related to the insertion of the Si δ-layer used to dope the wires. In addition, in the QWr-doped devices, the decrease of the solar conversion efficiencies at low temperatures and the associated decrease of the integrated external quantum efficiency through InGaAs could be attributed to detected traps E1QWR_D, E2QWR_D, and E3QWR_D with activation energies of 0.0037, 0.0053, and 0.041 eV, respectively.
2017-01
SiC polytypes and doping nature effects on electrical properties of ZnO-SiC Schottky diodes
Journal of Microelectronic Engineering (Volume : 171)
Electrical properties of ZnO/SiC Schottky diodes with two SiC polytypes and N and P doping are investigated. Characterization was performed through I–V and C–V–f measurements. Schottky barrier height (Φb), ideality factor (n), and series resistance (Rs) were extracted from forward I–V characteristics. (Φb), carrier's concentrations (Nd-Na) and (Rs) frequency dependence were extracted from C–V–f characteristics. The extracted n values suggest that current transport is dominated by interface generation-recombination and/or barrier tunneling mechanisms. When changing SiC polytypes, the rectifying ratio of ZnO/n-4HSiC is found to be twice that of ZnO/n-6HSiC. A change in doping nature gave a leakage current ratio of 40 between ZnO/p-4HSiC and ZnO/n-4HSiC. These results indicate that ZnO/p-4HSiC diodes have a complex current transport compared to diodes on n-type SiC. From I-V measurements, barrier height values are 0.63 eV, 0.65 eV and 0.71 eV for heterojunction grown on n-6HSiC, n-4HSiC and p-4HSiC, respectively. C-V measurements gave higher values indicating the importance of interface density of states. Nss values at 1 MHz frequency are 4.54 × 1011 eV−1 cm−2, 3 × 1012 eV−1 cm−2 and 8.13 × 1010 eV−1 cm−2 for ZnO/n-6HSiC, ZnO/n-4HSiC and ZnO/p-4HSiC, respectively. Results indicate the importance of SiC poly types and its doping nature.
2017-01

2016

High-performance organic/inorganic hybrid heterojunction based on Gallium Arsenide (GaAs) substrates and a conjugated polymer
Applied Surface Science (Issue : 4) (Volume : 387)
In this paper, we present an extensive study of the electrical properties of organic-inorganic hybridheterojunctions. Polyaniline (PANI) thin films were deposited by a very simple technique on (1 0 0)and (3 1 1)B n-type Gallium Arsenide (GaAs) substrates to fabricate hybrid devices with excellentelectrical properties. The hybrid devices were electrically characterized using current–voltage (I–V),capacitance–voltage (C–V) and deep level transient spectroscopy (DLTS) measurements in the temper-ature range 20–440 K. The analysis of I–V characteristics based on the thermionic emission mechanismhas shown a decrease of the barrier height and an increase of the ideality factor at lower temperatures forboth hybrid devices. The interface states were analyzed by series resistance obtained using the C–G–Vmethods. The interface state density (Dit) of PANI/(1 0 0) GaAs devices is approximately one order ofmagnitude higher than that of PANI/(3 1 1)B GaAs devices. This behaviour is attributed to the effect ofcrystallographic orientation of the substrates, and was confirmed by DLTS results as well. Additionally,the devices show excellent air stability, with rectification ratio values almost unaltered after two years ofstorage under ambient conditions, making the polyaniline an interesting conductor polymer for futuredevices applications.
2016-06
Electrical performance of conducting polymer (SPAN) grown on GaAs with different substrate orientations
Applied Surface Science (Issue : 386) (Volume : 4)
This article reports the effect of n-type GaAs substrate orientation, namely (100), (311)A and (311)B, onthe electrical properties of sulfonated polyaniline (SPAN)/GaAs heterojunction devices. In addition, the inhomogeneity of the interface between various GaAs substrates and SPAN is investigated in terms of barrier height and ideality factor by performing I–V measurements at different temperatures (20–420 K).The I–V results indicate that the value of the rectification ratio (IF/IR) at 0.5 V is higher for SPAN/(311)B GaAs samples than for SPAN/(100) GaAs and SPAN/(311)A GaAs samples. Moreover, the barrier height decreases and the ideality factor increases with decreasing temperature for all three heterostructure devices. The high value of mean barrier¯˚bof SPAN/(311)B (calculated from the plots of ˚b0as a function of 1/2kT) confirms that the GaAs substrate orientation results in an increase of barrier homogeneities. Furthermore, the C-V characteristics were obtained at room temperature. The C-V measurements showed that the carrier distributions at the interface and away from the interface in high index (311) GaAs orientations are more uniform and have better barrier homogeneity than those grown on the conventional(100) GaAs substrates.
2016-06
Hyperfine interaction and tuning of magnetic anisotropy of cu doped CoFe2O4 ferrite nanoparticles
Journal of Magnetism and Magnetic Materials (Volume : 411)
Ferrimagnetic oxides may contain single or multi domain particles which get converted into superparamagnetic state near a critical size. To explore the existence of these particles, we have made Mössbauer and magnetic studies of Cu2þ substitution effect in CoFe2xO4 Ferrites (0.0, 0.1, 0.2, 0.3, 0.4, and 0.5). All the samples have a cubic spinel structure with lattice parameters increasing linearly with increase in Cu content. The hysteresis loops yield a saturation magnetization, coercive field, and remanent magnetization that vary significantly with Cu content. The magnetic hysteresis curves shows a reduction in saturation magnetization and an increase in coercitivity with Cu2þ ion substitution. The anisotropy constant, K1, is found strongly dependent on the composition of Cu2þ ions. The variation of saturation magnetization with increasing Cu2þ ion content has been explained in the light of Neel's molecular field theory. Mössbauer spectra at room temperature shows two ferrimagnetically relaxed Zeeman sextets. The dependence of Mössbauer parameters such as isomer shift, quadrupole splitting, line width and hyperfine magnetic field on Cu2þ ion concentration have been discussed.
2016-03

2015

Analysis of deep level defects in GaN p-i-n diodes after beta particle irradiation
Electronics (Issue : 4) (Volume : 4)
The effect of beta particle irradiation (electron energy 0.54 MeV) on the electrical characteristics of GaN p-i-n diodes is investigated by current-voltage (I-V), capacitance-voltage (C-V) and deep-level transient spectroscopy (DLTS) measurements. The experimental studies show that, for the as-grown samples, three electron traps are found with activation energies ranging from 0.06 to 0.81 eV and concentrations ranging from 1.2 × 1014 to 3.6 × 1015 cm−3, together with one hole trap with energy depth of 0.83 eV and concentration of 8 × 1014 cm−3. It has been found that the irradiation has no effect on these intrinsic defects. The irradiation affected only a shallow donor level close to Ec [0.06 eV-0.18 eV] on the p-side of the p-i-n junction.
2015-12
Electrical Behavior of MBE Grown Interfacial Misfit GaSb/GaAs Heterostructures With and Without Te-Doped Interfaces
IEEE Transactions on Electron Devices (Volume : 62)
A detailed study of interface states in interfacial misfit (IMF) grown GaSb on GaAs substrates is presented. Two types of structures, namely, uncompensated and Te compensated, are investigated using current–voltage, capacitance–frequency, conductance–frequency, and deep level transient spectroscopy techniques. Our studies reveal that incorporation of Te at the interface (IMF) causes a degradation of the Te-compensated devices. A higher number of electrical active defects and higher value of interface states are detected in Te-compensated IMF GaSb/GaAs devices compared with as-grown IMF GaSb/GaAs devices.
2015-12
Effect of post growth annealing treatment on Interfacial Misfit GaSb/GaAs
Materials Science in Semiconductor Processing (Issue : 5) (Volume : 36)
Post-growth annealing treatments in the range 400–600 1C are performed on GaSb/GaAs Interfacial Misfit grown samples. Current density–voltage(J–V), Capacitance–voltage(C–V), capacitance–frequency (C–F) and Deep Level Transient Spectroscopy(DLTS) measurements are performed on as-grown and annealed samples.Ourstudiesshowthatpossibledefectcompensationisobservedwiththeannealing treatments, resulting in a significant improvement in the performances of the devices.
2015-08
Modeling the effect of deep traps on the capacitance-voltage characteristics of p-type Si-doped GaAs Schottky diodes grown on high index GaAs substrates
Materials Science in Semiconductor Processing (Issue : 8) (Volume : 36)
Numerical simulation, using SILVACO-TCAD, is carried out to explain experimentally observed effects of different types of deep levels on the capacitance–voltage characteristics of p-type Si-doped GaAs Schottky diodes grown on high index GaAs substrates.Two diodes were grown on (311)A and (211)A oriented GaAs substrates using Molecular Beam Epitaxy (MBE).Although,deep levels were observed in both structures, the measured capacitance–voltage characteristics show a negative differential capacitance (NDC) for the (311)A diodes, while the (211)A devices display a usual behaviour. The NDC is related to the nature and spatial distribution of the deep levels, which are characterized by the Deep Level Transient Spectroscopy (DLTS) technique. In the (311)A structure only majority deep levels (hole traps) were observed while both majority and minority deep levels were present in the (211)A diodes. The simulation, which calculates the capacitance–voltage characteristics in the absence and presence of different types of deep levels, agrees well with the experimentally observed behaviour.
2015-08
Rapid thermal annealing: An efficient method to improve the electrical properties of tellurium compensated Interfacial Misfit GaSb/GaAs heterostructures
Superlattices and Microstructures (Volume : 88)
The effect of thermal annealing on Te compensated Interfacial Misfit GaSb/GaAs heterostructures is investigated by using two different thermal annealing procedures, namely rapid thermal annealing and furnace annealing. The electrical properties of the devices are studied by using Current-Voltage, Capacitance-Voltage and Deep Level Transient Spectroscopy techniques. It is observed that rapid thermal annealing treatment is superior in terms of improvement of the electrical characteristics compared to furnace annealing treatment. The lowest leakage current and defect concentration are obtained when rapid thermal annealing is employed.
2015-08
12. Thin Film Deposition Processes
International Journal of Modern Physics and Applications (Volume : 1)
small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. This project examines some remarkable similarities and differences between PVD and CVD systems as well as evaluates the different techniques of depositing thin film. The majority of researchers have attempted to explain and justify the most precise system for depositing thin film since it is important in several applications such as surgical/medical and automotive. It is concluded that the most efficient method of depositing is PVD process. In addition, it has been found that there are more differences than similarities between PVD and CVD processes.
2015-08
Investigation of the Effects of Gamma Radiation on the Electrical Properties of Dilute GaAs1-xNx Layers Grown by Molecular Beam Epitaxy
Current Applied Physics (Volume : 15)
This work reports the effect of gamma (g-) irradiation on dilute GaAsN with nitrogen concentrations ranging from 0.2 to 1.2% with post-irradiation stability using Current-Voltage (I-V) and Deep Level Transient Spectroscopy (DLTS) measurements in the temperature range from 10 K to 450 K. The I-V results indicate that the irradiation effect was more pronounced in the samples with nitrogen concentration of 0.4%. Additionally, the irradiated samples showed an ideality factor higher than the as-grown samples. On the other hand, for temperatures above 265 K the barrier height of the irradiated samples with 0.8% nitrogen is higher than the as-grown samples. The DLTS measurements revealed that after irradiation the number of traps either decreased remained constant, or new traps are created depending on the concentration of nitrogen. For samples with N ¼ 0.2% e 0.4% the number of traps after irradiation decreased, whereas for samples with N ¼ 0.8%  1.2 % the number of traps remained the same. However, the properties of some traps such as capture cross-sections and density increased by about 2 orders of magnitude. The origin of the defects present before and after irradiation are discussed and correlated.
2015-07

2014

X-Ray Diffraction and DC Electrical Conductivity for Te61.8Se38.2 Thin Films
International Journal of Science and Research (IJSR) (Issue : 8) (Volume : 3)
Vacuum alloying system was designed and built up to alloy (Te61.8Se38.2). Te61.8Se38.2thin films were prepared by thermal evaporating system under pressure about (5×10-5) mbar. Three thin films samples were prepared in one evaporation run, one in the center of the evaporation source and the other two beside it (using flat substrate holder) to study the effect of evaporation angle on properties of Te61.8Se38.2 thin film. X-ray fluorescence (XRF) has been used to investigate the purity of the primary materials and Te61.8Se38.2 alloy.Also (XRD) system has been used to investigate the structure of the Te61.8Se38.2 alloy and Te61.8Se38.2thin films.The electrical measurements of thin film samples, showed that the center sample hasan activation energy (0.575eV and its thickness 415 nm) and for sided sample has an activation energy (0.61eV and its thickness 340 nm).
2014-08

2013

Deep traps and temperature effects on the capacitance of p-type Si-doped GaAs Schottky diodes on (211) and (311) oriented GaAs substrates
Superlattices and Microstructures (Issue : 8) (Volume : 65)
The SILVACO-TCAD numerical simulator is used to explain the effect of different types of deep levels on the temperature dependence of the capacitance of p-type Si-doped GaAs Schottky diodes grown on high index GaAs substrates, namely (311)A and (211)A oriented GaAs substrates. For the (311)A diodes, the measured capacitance–temperature characteristics at different reverse biases show a large peak while the (211)A devices display a much smaller one. This peak is related to the presence of different types of deep levels in the two structures. These deep levels are characterized by the Deep Level Transient Spectroscopy (DLTS) technique. In the (311)A structure only majority deep levels (hole deep levels) were observed while both majority and minority deep levels were present in the (211)A diodes. The simulation software, which calculates the capacitance–voltage and the capacitance–temperature characteristics in the absence and presence of different types of deep levels, agrees well with the experimentally observed behavior of the capacitance–temperature properties. A further evidence to confirm that deep levels are responsible for the observed phenomenon is provided by a simulation of the capacitance–temperature characteristics as a function of the ac-signal frequency.
2013-11
Deep-level transient spectroscopy of interfacial states in "buffer-free" p-i-n GaSb/GaAs devices
Applied Physics (Issue : 13) (Volume : 14)
A systematic study was carried out on defect states in Interfacial Misfit (IMF) unpassivated and Tepassivated IMF in p-i-n GaSb/GaAs devices using Deep Level Transient Spectroscopy (DLTS) and Laplace DLTS. Additionally, Current-Voltage (I–V) measurements were performed, which showed that the turn-on voltage (Von) of passivated samples is lower than that for unpassivated samples; an effect which can be explained by the introduction of new defects states near to the interface of GaSb/GaAs, where Te was incorporated to passivate the IMF. The Capacitance-Voltage (C-V) analysis demonstrates that these new states are the consequence of adding Te at the misfit of GaSb/GaAs. Furthermore, DLTS measurements reveal a distribution of states including a main midgap energy level, namely the well documented EL2 trap, with some peculiar behaviour. Most of these levels are related to interface states that are generated by the mismatch between GaAs and GaSb. Originally, the addition of Te atoms was thought to passivate these interface states. On the contrary, this paper, which attempts at correlating the current-voltage and capacitance-voltage characteristics to the DLTS results, shows clearly that Te atoms increase the density of interface states.
2013-09

2016

ELECTRICAL PROPERTIES OF SULFONATED POLYANILINE (SPAN) AND POLYANILINE (PANI) POLYMERS GROWN ON CONVENTIONAL AND HIGH INDEX GaAs SUBSTRATES
PhD Thesis
2016-07-27

2008

X-Ray Diffraction and DC Electrical Conductivity for Te61.8Se38.2 Thin Films
MSc Thesis
2008-12-18

2019

Nanotechnology and Enhancement of Solar Efficiency and the Electrical Properties of Conducting Polymers
3rd National Nanotechnology Workshop, Tishk International University, Erbil, Kurdistan Region-Iraq
N
2019-12
Bologna Process
Second Educational Conference of Colleges of Basic Education in Kurdistan Region, Salahaddin University-Erbil, Kurdistan Region-Iraq
N
2019-04

2018

Effects of Substrate Orientation on the Solar Efficiency and the Electrical Properties of Conducting Polymer grown on GaAs
Iraqi-German Winter School on Nanophotonics, Delmenhorst, Germany
N
2018-10
Investigation of the Effects of Substrate Orientation on the Solar Efficiency of Conducting Polymer (SPAN) grown on GaAs
1st International Conference on Current Nanotechnology and its Applications (ICCNA2018), Irbid, Jordan
N
2018-04

2017

Investigation of the Effects of Substrate Orientation on the Solar Efficiency and the Electrical Properties of Sulfonated Polyaniline (SPAN) grown on GaAs
Iraqi-German Winter School on Nanophotonics, Delmenhorst, Germany
N
2017-12

2016

Electrical properties of conducting polymer of sulfonated polyaniline (SPAN) grown on conventional (100) and high index and (311)B GaAs substrates
10th edition International Conference of Polish Society for crystal Growth (ICPSCG 10), WDW Kościelisko, Zakopane, Poland
N
2016-10
Electrical Properties of Sulfonated Polyaniline (SPAN) Grown on High Index GaAs Planes Using Current-Voltage, Capacitance and Deep Level Transient Spectroscopy (DLTS)
Workshops (Solar Cell Energy), University of Nottingham, Nottingham, United Kingdom
N
2016-09
Investigation of Defects in Sulfonated Polyaniline (SPAN) Grown on High Index GaAs Planes Using Current-Voltage, Capacitance and Deep Level Transient Spectroscopy (DLTS)
18th International Conference on Extended Defects in Semiconductors, EDS2016, Les Issambres, France
N
2016-09
High-performance organic/inorganic hybrid heterojunction based on Gallium Arsenide (GaAs) substrates and a conjugated polymer
40th WOCSDICE & 13th EXMATEC workshops, Aveiro, Portugal
N
2016-06
Effect of Substrate Orientation on the Solar Efficiency and the Electrical Properties of Sulfonated Polyaniline (SPAN), Grown on (100) and (311)A GaAs
5th Anniversary of ANSOLE (2011-2016): International Conference on Renewable Energy (INCORE2016), Cairo, Egypt February 3-6, (2016).
N
2016-02
Investigation of Defects in Polyaniline (PANI) Grown on High and Low Index GaAs Planes Using Current-Voltage, Capacitance and Deep Level Transient Spectroscopy (DLTS)
The 3th international conference on nanotechnology and its applications (ICNA–III-2016), Hurghada, Egypt
No
2016-02

2015

Effect of Substrate Orientation on the Electrical Properties of Polyaniline deposited on GaAs (100) and (311)B n-Type
The 28th International Conference on Defects in Semiconductors ICDS 2015, Aalto University Campus in Espoo, Finland
N
2015-07
Investigation of Defects in Polyaniline (PANI) Grown on n-Type (100) and (311)A GaAs Substrates Using Current-Voltage, Conductance and Deep Level Transient Spectroscopy (DLTS)
Annual Tessella Postgraduate Poster Competition, University of Nottingham, United Kingdom
N
2015-02

2014

Investigation of Defects in Polyaniline (PANI) Grown on High Index GaAs Planes Using Current-Voltage, Conductance and Deep Level Transient Spectroscopy (DLTS)
17th International Conference on Extended Defects in Semiconductors (EDS-2014), Gottingen, Germany, 14-19 September, (2014).
One of the most important class of organic and conjugated polymers is polyaniline (PANI) that possesses excellent optical, electronic, and redox properties [1]. Conductive polymer PANI grown on III-V semiconductor substrates has many advantages in photovoltaic applications [2, 3]. Polymers can be grown over large area with low cost. However, the presence of interfacial states due to the presence of a layer of oxygen over the semiconductor substrate (GaAs) causes serious issues in the performance of these devices. It is therefore vital to have knowledge of interfacial states and types of defects introduced during growth and/or processing. In this work we will report the first systematic studies of PANI grown on n-type (311)A and (311)B GaAs substrates. Current-Voltage-Temperature measurements were performed to determine the ideality factor (n) and barrier height (φB) of the heterojunction using the Schottky barrier model. Capacitance-Conductance-Frequency measurements were carried out at 0V DC bias voltage on both PANI/(311)A GaAs and PANI/(311)B GaAs, and shallow level is detected at the interface. In addition, series resistance (Rs) for both samples have been calculated by Capacitance-Conductance-Frequency measurements. In order to confirm further the type of defects, DLTS measurements are performed with small reverse bias (VR=-0.25V, VP=0V) and forward bias (VR=0V, VP=0.25V). The DLTS technique is powerful technique to determine traps present at the interfaces. The DLTS measurements revealed a hole trap which has almost the same energy as the one detected by conductance measurements. This confirms the defect detected by conductance measurements in both devices is a hole trap that is present in PANI. Moreover, DLTS revealed that both samples PANI/(311)A GaAs and PANI/(311)B GaAs exhibit hole and electron traps. The reverse current-voltage characteristics show that the deep electron trap is one of the major cause of the high reverse current in PANI/(311)A GaAs samples. It is worth pointing out that our PANI/(311)A GaAs and PANI/(311)B GaAs samples have better properties in terms of reverse currents than those previously reported PANI/(100) GaAs [2, 3] devices. [1] S. E. El-Zohary et al., Journal of Nanomaterials, Vol. 2013, p. 8 (2013). [2] F. Yakuphanoglu and B. F. Şenkal, Synthetic Metals, Vol. 158, pp. 821-825 (2008). [3] D. P. Halliday et al., Synthetic Metals, Vol. 102, p. 877 (1999).
2014-09
Investigation of Defects in Polyaniline (PANI) Grown on n-Type (100) and (311)A GaAs Substrates Using Current-Voltage, Conductance and Deep Level Transient Spectroscopy (DLTS)
10th International Conference on Electroluminescence and Organic Optoelectronics, Cologne, Germany
N
2014-09
Defects Study in Polyaniline (PANI) Grown on GaAs (100) and (311)B n-Type Substrates Using Current-Voltage, Conductance and Deep Level Transient Spectroscopy (DLTS)
Materials Challenges in Devices for Fuel Solar Production and Employment, the Abdus Salam International Centre for Theoretical Physics (ICTP), Trieste, Italy
N
2014-05
Defects study in PANI grown on normal and high index GaAs planes using Current-Voltage, Conductance and Deep Level Transient Spectroscopy
Annual Tessella Postgraduate Poster Competition, The University of Nottingham, United Kingdom
N
2014-02

2013

Defects study in PANI grown on normal and high index GaAs planes using Current-Voltage, Conductance and Deep Level Transient Spectroscopy
15th International Conference on Defects–Recognition, Imaging and Physics in Semiconductors (DRIP-XV), Warsaw, Poland
N
2013-09
Effect of Post Growth Thermal Annealing on Deep Level Defects in MBE Grown Dilute Nitride Ga1−xInxNyAs1−y p-i-n Structures
COST MP0805 Final Meeting, Istanbul University, Istanbul, Turkey
N
2013-09
Effect of Nitrogen on the Optical and Structural Properties of Dilute GaInNAs Double Quantum Wells Grown by MBE on (100), (311)A and (311)B GaAs Substrates
17th European Molecular Beam Epitaxy Workshop, Levi, Finland
N
2013-03

2012

Molecular Beam Epitaxy of Dilute III-V Bismide/Nitride: Development of Emerging Semiconductors for Next Generation Photovoltaics
Sustainable Chemical and Biological Processing (SCBP) Priority Group, Nottingham, United Kingdom.
N
2012-12

2023

Europe (Italy and Spain) and Kurdistan
TeachersMOD – Future Elementary School Teachers Modernization in Kurdistan
2023-11-12,2023-11-18
Erbil (APPRAIS software for KRG Universities)
APPRAIS software
2023-07-24,2023-07-25
Erbil (APPRAIS project, WP5)
WP5 Harmonisation and restitution workshop
2023-02-27,2023-02-28

2022

Oslo University, 9 - 13 May 2022 Oslo, Norway
WP3: Strategic Planning, Management and Quality Assurance: Capacity Building Action
2022-05-09,2022-05-13

2015

Training course on Solar Cell system. In The University of Nottingham, Nottingham, United Kingdom.
Solar Cell System
2015-09-06,2015-10-02
Training course on growth of polymers (Organic Semiconductors) on III-IV semiconductor substrate by chemical process and spin coating technique. In The University of Nottingham, Nottingham, United Kingdom.
Growth of Polymers (Organic Semiconductors) on III-IV Semiconductor Substrate by Chemical Process and Spin Coating Technique
2015-08-03,2015-08-31

2014

Training course on growth of III-IV semiconductor samples by Metal Organic Chemical Vapor Deposition (MOCVD). From 20-27 December 2014 in Anna University, India.
Growth of III-IV Semiconductor Samples by Metal Organic Chemical Vapor Deposition (MOCVD)
2014-12-20,2014-12-27
Intellectual property inc copyright: for new Science, Eng & M&HS researchers. The University of Nottingham, Nottingham, United Kingdom.
Intellectual property inc copyright: for new Science, Eng & M&HS researchers
2014-02-04,2014-02-04

2013

Training course on fabrication semiconductors devices. In The University of Nottingham, Nottingham, United Kingdom.
Fabrication Semiconductors Devices in Clean Room Using Different Techniques.
2013-09-09,2013-10-11
Further LaTeX for researchers: developing your skills in LaTeX. The University of Nottingham, Nottingham, United Kingdom.
Further LaTeX for researchers
2013-05-21,2013-05-22
LaTeX for researchers: an introduction. The University of Nottingham, Nottingham, United Kingdom.
LaTeX
2013-05-14,2013-05-15
Microsoft PowerPoint: Introduction. The University of Nottingham, Nottingham, United Kingdom.
Microsoft PowerPoint
2013-02-04,2013-02-08
Demonstrating in Laboratory Practical. The University of Nottingham, Nottingham, United Kingdom.
Demonstrating in Laboratory Practical
2013-02-04,2013-02-05

2012

Introduction to solid-state devices (2012-2013). The University of Nottingham, Nottingham, United Kingdom.
Solid-State Devices
2012-12-31,2013-03-29
11. Crystallography (2012-2013). The University of Nottingham, Nottingham, United Kingdom.
Crystallography
2012-12-03,2013-02-28
Epitaxial growth of the group-IV semiconductor materials (2012-2013). The University of Nottingham, Nottingham, United Kingdom.
Epitaxial Growth of the Group-IV Semiconductor Materials
2012-12-03,2013-02-28
Academic course on English language (9 months) Jubilee Campus, The University of Nottingham, United Kingdom, January 2012- September 2012.
Academic course on English language
2012-01-03,2012-09-28

2011

Training course on English language (Seven months) Castel College, Nottingham, United Kingdom, April 2011- November 2011.
English language
2011-04-11,2011-11-18

2009

Training course on Teaching Methods (three months), November, 2009 University of Duhok, Kurdistan-Iraq.
Teaching Methods
2009-09-01,2019-12-01
Training course on Computer (two months) 2009, University of Duhok, Kurdistan-Iraq.
Microsoft Office
2009-01-03,2019-03-07

2005

Training course on English language (two months) University of Duhok, August-October 2005.
English language
2005-08-01,2005-10-06

2017

Electrical Properties and Deposition Methods of Semiconductors Devices
Book
2017-07-14